target

Metal target material

Metal target is an important material for thin film preparation, which has good conductivity and thermal conductivity. It is widely used in optical coating, electronic devices and other fields.

Alloy target material

The alloy target consists of two or more metal elements, which can adjust the performance of the target. It is widely used in film preparation.

Semiconductor target material

Semiconductor targets are key materials for preparing semiconductor film, which are widely used in the fields of optoelectronics and integrated circuits.

Oxide target material

Oxide target is a compound formed by metal and oxygen, which has a special physical and chemical properties. It is widely used in film preparation and material research.

Nitride target material

Nitride target is a compound formed by metal and nitrogen elements, which has excellent performance. It is widely used in the fields of optoelectronics and energy.

Sulfide target material

Sulfide target is a compound formed by metal and sulfur, and has a special physical properties. It is widely used in film preparation and functional materials.

Antimony tellurium selenium boron target material

Several selenium boron targets are compound targets composed of elements such as 锑, 碲, selenium, and boron, and have excellent photovoltaic properties. It is widely used in photovoltaic, photoelectronics and thermal power.

Sputtering Target

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