Semiconductor target material

Carbon (C) sputtering targets are renowned for their excellent electrical and thermal conductivity. They are used in various applications, including microelectronics and hard coating industries.

Silicon (Si) sputtering targets are known for their high purity and versatility, making them ideal for semiconductor, solar cell, and thin film applications.

Germanium (Ge) sputtering targets are notable for their high purity and excellent thermal properties. They are extensively used in the manufacture of semiconductors and infrared optical devices.

Boron (B) sputtering targets exhibit unique chemical and physical properties, which make them well-suited for applications in semiconductor devices and nuclear technology.

Antimony (Sb) sputtering targets are valued for their unique properties such as their low thermal conductivity and brittleness. They find applications in the electronics industry and photovoltaic materials.

Tellurium (Te) sputtering targets are known for their high conductivity and find use in the fabrication of semiconductors, thermoelectric devices, and photovoltaic cells.