Oxide target material

Aluminum oxide (Al2O3) sputtering targets are renowned for their hardness and resistant nature. Their high purity levels make them suitable for use in various optical, electronic, and structural applications.

Silicon dioxide (SiO2) sputtering targets are widely known for their high purity and versatility, making them ideal for various applications like semiconductor devices, microelectronics, and optical applications.

Titanium dioxide (TiO2) sputtering targets are notable for their chemical stability and high refractive index. They find use in applications like optical coatings, solar cells, and photocatalysis.

Chromium(III) oxide (Cr2O3) sputtering targets are known for their corrosion resistance and thermal stability, making them ideal for applications such as data storage, decorative coatings, and solar cells.

Nickel(II) oxide (NiO) sputtering targets are frequently used in various electronic applications due to their excellent electrical and magnetic properties. They have high purity and are perfect for producing high-quality films.

Copper(II) oxide (CuO) sputtering targets are used widely in semiconductors and other electronic devices due to their superior electrical properties. They have high thermal conductivity and are resistant to corrosion.

Zinc Oxide (ZnO) sputtering targets are widely recognized in the deposition of high-quality ZnO films, boasting excellent electrical and optical properties. They find extensive application in the manufacture of thin film transistors, solar cells, and LEDs.

Zirconium Dioxide (ZrO2) sputtering targets are known for their high melting points, and outstanding resistance to corrosion and wear. They are widely utilized in the manufacturing of ceramic capacitors and fuel cells.

Indium Tin Oxide (ITO) sputtering targets are highly valued in the industry for their outstanding electrical conductivity and transparency to visible light, making them the ideal choice for creating transparent conducting films. They're extensively utilized in applications such as flat-panel displays, smart windows, polymer-based electronics, and thin-film solar cells.

Indium Zinc Oxide (IZO) sputtering targets are prized for their high electrical conductivity and optical transparency, which makes them particularly suitable for applications in the optoelectronic industry, such as flat panel displays and thin-film solar cells.

The Aluminum-doped Zinc Oxide (AZO) sputtering target is a coveted product in the electronic industry due to its favorable electrical conductivity and optical transparency. It is also less costly and less scarce compared to ITO, making it an attractive alternative for similar applications such as transparent conducting films.

Cerium Dioxide (CeO2) sputtering targets are renowned for their capacity to produce high-quality thin films used in the production of ceramics and catalysts. The high purity of these targets ensures a consistent and uniform film.

Tungsten Trioxide (WO3) sputtering targets are useful in producing high-purity thin films used in photovoltaics and electrochromic devices due to their superior electrical conductivity and optical properties. These targets enable efficient deposition and uniformity, which are critical in various applications.

Hafnium Dioxide (HfO2) sputtering targets offer excellent corrosion resistance and stability, making them ideal for producing thin films in semiconductor devices. These targets are essential for advanced applications due to their high refractive index and low absorption coefficient at various wavelengths.

Indium Gallium Zinc Oxide (IGZO) sputtering targets are known for their superior mobility and transparency, which are vital in the fabrication of thin-film transistors (TFTs). These targets also possess low off-state current and high on/off current ratio, enhancing device performance.