Magnesium aluminate spinel (MgAl2O4)

Magnesium aluminate (MgAl2O4) can be used as a substrate for III-V nitride device thin films, and is also widely used in acoustic and microwave devices, as well as fast IC epitaxial substrates. In addition, it has good lattice matching with epitaxial silicon thin films. The self doping amount of aluminum atoms in the epitaxial silicon thin layer is small, the thermal stability is good, the expansion coefficient of silicon is relatively close, the hardness is small, and the processing performance is good., Therefore, it can be used as one of the high-quality insulation lining bottom materials for ultra high speed large-scale integrated circuits. At present, we can provide high-quality substrates with a maximum diameter of 2 inches (half height width<50 arc seconds, roughness Ra<0.5 nanometers) without twins, crystal domains, and ultra smooth.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality MgAl2O4 crystal,targets,materials.

Applications

Magnesium aluminate (MgAl2O4) can be used as a substrate for III-V nitride device thin films and is also widely used in acoustic and microwave devices, as well as fast IC epitaxial substrates.

It can be used as one of the high-quality insulation lining substrates for ultra high speed large-scale integrated circuits.

Features

Magnesium aluminate (MgAl2O4) crystal has good transparency and can transmit light in a wide wavelength range from ultraviolet to infrared.
This material has excellent thermal and chemical stability, and can maintain its performance in high temperature and chemically corrosive environments.
The thermal expansion coefficient of magnesium aluminate crystal substrate is relatively low, so its size changes less when temperature changes, which is crucial for maintaining the stability of microelectronics and optoelectronic devices.
• Its Lattice constant matches well with many important semiconductor materials (such as gallium nitrogen), making it an ideal substrate for growing these materials.
The magnesium aluminate crystal substrate has excellent electrical insulation performance and is suitable for use as an insulation layer in electronic equipment.

  • Growth Method

    Czochralski

    Crystal Structure

    Cubic

    Lattice Constant

    a=8.085Å

    Melting Point

    2130℃

    Density

    3.64 (g/cm3)

    Mohs Hardness

    8 (mohs)

    Color

    White transparent

    Thermal Expansion

    7.45×10-6 /K

    Dimension

    10x3mm10x5mm10x10mm15x15mm20x15mm20x20mm


    Ф1″Ф2″,

    Thickness

    0.5mm1.0mm

    Polishing

    One side or two sides

    Orientation

    <100><110><111>±0.5º

    Crystal Plane Orientation Accuracy

    ±0.5°

    Edge Orientation Accuracy

    Special requirements can reach within 1°

    Bevel Wafer

    According to specific requirements, wafers with edge-oriented crystal planes inclined at a specific angle (inclination angle 1°-45°) can be processed.

    Surface Roughness

    Ra≤5Å5×5µm

    Package

    Class 100 clean bag, Class 1000 super clean room