Lanthanu m aluminate (LaAlO3)

Lanthanu m aluminate is an important crystal material with good dielectric property, high dielectric constant and high thermal stability. Therefore, Lanthanu m aluminate has broad application prospects in electronics, optics, energy and other fields.
For example, in the field of electronics, Lanthanu m aluminate can be used as a thin film dielectric layer to manufacture ceramic microwave dielectric devices with high dielectric constant; In the field of optics, Lanthanu m aluminate can be used as a highly transparent UV light barrier film, which is widely used in optoelectronic devices such as lasers and photo Photophore; In the energy field, Lanthanu m aluinate can be used as the cathode material of fuel cells to improve the emf efficiency of fuel cells.
Therefore, Lanthanu m aluminate has broad application prospects and will be widely used in the future.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality LaAlO3 crystal,targets,materials.

Applications

Produce high-temperature superconducting microwave electronic devices (such as Tongxin high-temperature superconducting microwave filters).

Features

• Lanthanu m aluminate (LaAlO3) is a photoelectric material with excellent performance, which is usually used as a substrate material.
• The lattice parameters of Lanthanu m aluminate crystal are close to some important semiconductor materials (such as GaN), which makes it an ideal substrate for growing these materials.
• Lanthanu m aluminate crystal has high melting point and hardness, shows good thermal stability, and is suitable for high temperature growth and processing conditions.
This crystal has excellent optical transparency, especially in the ultraviolet region, and can be used to prepare ultraviolet optoelectronic devices.
• The dielectric constant of Lanthanu m aluminate crystal is moderate, which makes it have application potential in microelectronics and RF equipment.
• Good match with High-temperature superconductivity materials and lattice (such as YBaCuO).
It has low dielectric constant and low microwave loss.

  • Crystal Structure

    M6normal  temperature

    M3>435℃

    Lattice Constant

    M6 a=5.357A   c=13.22 A

    M3 a=3.821 A

    Melting Point

    2080℃

    Density

    6.52g/cm3

    Mohs Hardness

    6-6.5mohs

    Thermal Expansion

    9.4x10-6/K

    Dielectric Constants

    ε=21

    Secant Loss10GHz)

    3×10-4@300k,0.6×10-4@77k

    Color and Appearance

    To anneal and conditions differ from brown to brownish
    The polished substrate has natural twin domains
    .

    Chemical Stability

    Room temperature is not dissoluble in minerals, the temperature is greater than 150 ℃ in soluble h3po4

    Characteristics

    For microwave electron device

    Growth Method

    Czochralski

    Dimension

     

    10x3mm10x5mm10x10mm15x15mm20x15mm20x20mm

    Ф15,Ф20Ф1″Ф2″,Ф2.6″

    Thickness

    0.5mm1.0mm

    Polishing

    One side or two sides

    Orientation

    <100  110  111

    Crystal Plane Orientation Accuracy

    ±0.5°

    Edge Orientation Accuracy

    Special requirements can reach within 1°

    Bevel Wafer

    According to specific requirements, wafers with edge-oriented crystal planes inclined at a specific angle (inclination angle 1°-45°) can be processed.

    Surface Roughness

    Ra≤5Å5×5µm

    Package

    Class 100 clean bag, Class 1000 super clean room