Palladium (Pd(T))

Palladium sputtering targets are made from highly pure palladium, used extensively for thin film deposition via Physical Vapor Deposition (PVD). The process involves the use of high-energy ions to bombard the palladium target, which dislodges palladium atoms that then deposit on a substrate to form a thin film. These targets are particularly useful in the electronics and catalysis industries, creating thin films for catalytic converters, hydrogen storage materials, fuel cells, electrochemical sensors, and microelectronics. The high purity, thermal stability, corrosion resistance, and superior catalytic performan

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality Pd(T) crystal,targets,materials.