Ruthenium (Ru(T))

Ruthenium (RU) sputtering targets are important in the semiconductor industry to manufacture high-performance memory chips. Ruthenium has a high melting point, high hardness and good conductivity, making it a suitable material for manufacturing high-density memory chips. In addition, it is resistant to corrosion and oxidation, making it suitable for use in harsh environments. These targets are also used to create thin films and coatings in electrons, as well as as catalysts for chemical reactions. They can be used for RF and DC magnetron sputtering.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality Ru(T) crystal,targets,materials.

Applications

• Manufacturing of high-performance memory chips in the semiconductor industry
• Creation of thin films and coatings in electronics
• Catalysts in chemical reactions
• Electrochemical capacitors

Features

• High melting point and hardness
• Good electrical conductivity
• Corrosion and oxidation resistance
• Suitable for RF (Radio Frequency) and DC (Direct Current) magnetron sputtering