Iridium (Ir(T))

Iridium (Ir) sputtering targets are crucial components in the process of physical vapor deposition (PVD), which is a common method used to produce thin films for a wide range of applications. Iridium, a platinum group metal, has unique physical and chemical properties, including a high melting point, superior thermal stability, high density, and outstanding corrosion resistance. These qualities make iridium an ideal material for sputtering targets. Ir targets are utilized in the fabrication of semiconductors, production of wear-resistant coatings, catalysts in chemical reactions, and electrodes in chlorine production. Moreover, the high-density and low reactivity of iridium make it useful in crucibles for high-temperature melting applications. RF and DC magnetron sputtering can be successfully performed with iridium targets, further extending their utility.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality Ir(T) crystal,targets,materials.