Aluminium (Al(T))

Aluminum (Al) sputtering targets are extremely popular in various industries due to their versatile applications. In semiconductor fabrication, aluminum targets are used for thin film deposition. Aluminum is a light, strong metal with excellent thermal and electrical conductivity, making it an optimal material for sputtering targets. In addition to the semiconductor industry, aluminum targets are used for creating reflective layers in optical devices, protective and decorative coatings in aerospace and automotive industries, and barrier layers in packaging materials. Aluminum's reflectivity and strength make it a great choice for these applications. They can be used in both RF and DC magnetron sputtering.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality Al(T) crystal,targets,materials.

Applications

• Thin film deposition in the fabrication of semiconductors
• Reflective layers in optical devices
• Protective and decorative coatings in aerospace and automotive industries
• Barrier layers in packaging materials

Features

• Lightweight and strong
• High thermal and electrical conductivity
• Excellent reflectivity
• Suitable for RF (Radio Frequency) and DC (Direct Current) magnetron sputtering