Manganese (Mn(T))

Manganese (MN) sputtering targets are widely used in the thin film industry. Manganese's high melting point and oxidation resistance make it an ideal material for a variety of applications, including semiconductors, batteries, catalysts, and steel and aluminum alloys. In addition, due to its high melting point, manganese is also used in high temperature applications.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality Mn(T) crystal,targets,materials.

Applications

• Semiconductors
• Batteries
• Catalysts
• Steel and aluminum alloys

Features

• High melting point
• Oxidation resistance
• Hard and brittle
• Suitable for RF (Radio Frequency) and DC (Direct Current) magnetron sputtering