Hafnium (Hf(T))

Hafnium (Hf) sputtering targets are widely used in the thin film industry due to their high temperature resistance. They are primarily used for the deposition of hafnium-based thin films in applications such as integrated circuits and fiber optic cables. Additionally, due to hafnium's high neutron-absorption cross-section, these targets are also utilized in the manufacture of control rods in nuclear reactors.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality Hf(T) crystal,targets,materials.