Nickel-Vanadium (NiV(T))

The Nickel-Vanadium (NiV) sputtering target, an alloy of Nickel and Vanadium, has notable benefits in the field of thin film deposition. The high sputtering yield of the NiV target enables the formation of consistent and high-quality films. Besides, the low impurity levels in the target contribute to the superior performance of the resultant devices. The NiV target is primarily used in the manufacturing of energy storage devices, underlining its role in the burgeoning renewable energy sector. Additionally, the target's unique properties make it apt for producing electrochemical capacitors. These capacitors, known for their fast charge-discharge cycles and long lifespan, are vital components in various electronics. The NiV target, with its distinctive attributes and wide-ranging applications, holds a significant position in material science.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality NiV(T) crystal,targets,materials.