Aluminum-Silicon-Copper (AlSiCu(T))

The Aluminium Silicon Copper (AlSiCu) sputtering target is a unique blend of aluminium, silicon, and copper, offering outstanding electrical and thermal properties. This amalgamation of features makes it highly suitable for the semiconductor industry, where it is used to deposit thin films on various devices. The high-quality films obtained from AlSiCu targets significantly improve the efficiency and durability of the devices, thereby driving their performance. Additionally, these targets have a high degree of purity, ensuring that the films are devoid of any impurities that might affect the device's functioning. From electronic components to complex semiconductor devices, the AlSiCu sputtering target's application is wide-ranging, reinforcing its importance in the electronics industry.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality AlSiCu(T) crystal,targets,materials.