Cerium Oxide (CeO2(T))

Cerium Dioxide (CeO2) sputtering targets are valued for their ability to produce high-purity, consistent thin films, which are essential in the fabrication of ceramics, catalysts, and electronic devices. The uniform film formation capability of these targets allows for the production of high-performance materials that contribute to the efficiency and reliability of various technologies. With the escalating demand for these applications, the importance of CeO2 sputtering targets in the industry is poised to continue its upward trajectory.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality CeO2(T) crystal,targets,materials.