Hafnium Oxide (HfO2(T))

Hafnium Dioxide (HfO2) sputtering targets are extensively used in the production of thin films for semiconductor devices, optical coatings, and high-temperature applications. The outstanding corrosion resistance, high refractive index, and low absorption coefficient of these targets enable the production of high-quality materials that can withstand challenging conditions. With the rise in advanced technologies, the significance of HfO2 sputtering targets will continue to grow.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality HfO2(T) crystal,targets,materials.