Boron Nitride (BN(T))

Boron nitride (BN) sputtering targets are vital in depositing hard, lubricious, and chemical-resistant boron nitride films. Their high purity and uniform grain structure ensure the production of quality thin films. The optimal deposition rates make them suitable for various applications, including surface coatings, thin film deposition, and hard coatings. Their robustness and resistance to harsh environments further make these targets ideal for high-performance applications.

Dihedral Technology(DHD) Co., Ltd. manufacture and processing/provide multiple specifications and high quality BN(T) crystal,targets,materials.